稳定In/Si表面的LEED研究  

Study of In/Si stable surfaces by LEED

作　　者：李文杰[1] 姜金龙[1] 盖峥[1] 赵汝光[1] 杨威生[1] 

机构地区：[1]北京大学物理学院,人工微结构和介观物理国家重点实验室,北京100871

出　　处：《物理学报》2004年第2期521-526,共6页Acta Physica Sinica

基　　金：国家自然科学基金 (批准号 :1963 40 10 )资助的课题~~

摘　　要：利用LEED图形拟合的方法对大量不同取向In Si表面的稳定性和小面化进行了研究 ,新发现了In覆盖度在1 2单层原子以下的三个稳定表面 :Si(2 14 ) In ,Si(317) In和Si(4 36 ) In ,以及In覆盖度在 1单层原子左右的两个稳定表面Si(10 1) In和Si(313) In .此外还确定了In覆盖度在 1单层原子左右的 6个稳定In Si表面的家族领地以及In覆盖度在 1 2单层原子以下的 4个稳定In Si表面的家族领地 .特别值得注意的是Si(10 3) In的家族领地相当大 ,甚至比最稳定的Si(111) 7×With the method of LEED graphic fitting, we have made a thorough study on the stability and faceting of In/Si surfaces. As a result, three new In/Si stable surfaces with less than 0.5 ML coverage ,that is, Si(2 1 4)-In, Si(3 1 7)-In and Si(4 3 6)-In and two In/Si stable surfaces with about 1ML coverage, that is, Si(1 0 1)-In and Si(3 1 3)-In, have been found. Meanwhile, the family territories of total 4 In/Si stable surfaces with less than 0.5 ML coverage and 6 with about 1ML coverage have been roughly determined. Particulaty, the family territory of Si(1 0 3)-In is rather big, even a little bigger than that of Si(1 1 1)-In.

关 键 词：铟/硅表面 稳定表面 家族领地 覆盖度 低维结构 纳米技术 俄歇电子谱 LEED图形 

分 类 号：O562[理学—原子与分子物理]