低磷化学镀镍层的组成和结构  

COMPOSITION AND STRUCTURE OF THE LOW PHOSPHOROUS ELECTROLESS NICKEL COATING

作　　者：方景礼[1] 叶向荣[1] 方晶[1] 

机构地区：[1]南京大学应用化学研完所,南京210008

出　　处：《应用化学》1992年第5期34-38,共5页Chinese Journal of Applied Chemistry

摘　　要：用SEM、XPS、AES和X-射线衍射法研究了低磷化学镀镍层的形貌、结晶状态、组成元素及其价态和深度分布。结果表明,低磷化学镀镍磷合金层为层状结构,镀态的镀层由低晶态的Ni和Ni_2P组成,350℃热处理1小时后转化为完全晶态的Ni和Ni_3P。镍和磷均为零价态,它们的结合能分别为129.1ev和852.3eV。镀层的真实组成(相对原子百分浓度)为:Ni 85.4%,P 10.1%,O 4.5%。The morphology, crystalline state, composition elements and their depth, profile and valence state were studied by scannfing electron microscopy (SEMi), x-ray diffractometry (XRD) and electron spectrometry (XPS and AES). The result showed that the low phosphorous electroless nickel coating has a smooth lamellar structure, composed of Ni and Ni_2P of low crystalline state, but they were transformed into Ni and Ni_3P of complete crystalline state after heat treatment at 350℃ for 1h.The phosphorous and nickel in low phosphorous eleetroless nickel coating were in zero valance state, with binding energy being 129.1 eV and 852.3 eV respectively. The compositions(A.C.%) of the Ni-P coating were Ni 85.4%, P 10.1%, O 4.5% as obtained after the constant composition region of the AES depth profile curves of the Ni-P coating.

关 键 词：镍磷合金 镀层 化学镀镍 

分 类 号：TG115.23[金属学及工艺—物理冶金]