陶瓷溅射靶材的发展与应用  

The Development and Application of Sputtering Ceramic Target Materials

作　　者：吴智华[1] 蒋丹宇[2] 张骋[1] 

机构地区：[1]上海大学电子信息材料系,上海201800 [2]中国科学院上海硅酸盐研究所,上海200050

出　　处：《陶瓷科学与艺术》2004年第1期43-47,共5页Ceramics Science & Art

摘　　要：在信息产业不少基础产品的制造过程中需使用多种陶瓷溅射靶材,世界陶瓷靶材的市场销售规模日益扩大。本文简要介绍了陶瓷靶材的应用分类、性能要求、制备工艺及溅射靶材制造中急需解决的主要技术问题。Many kinds of sputtering ceramic target materials are necessary for manufacturing in IT and their market scale of are increasing rapidly.Applied classif cation of ceramic targets and their making process, as well as the main quality requirement and technology problems in manufacture are briefly discussed here.

关 键 词：陶瓷溅射靶材 电子材料 分类 性能要求 制备 

分 类 号：TQ174.1[化学工程—陶瓷工业]