真空微电子技术的研究与发展  

Research and Development of Vacuum Microelectronics Technology

作　　者：黄廷荣[1] 

机构地区：[1]南京电子器件研究所,210016

出　　处：《真空电子技术》1992年第5期8-13,共6页Vacuum Electronics

摘　　要：本文首先简论真空微电子技术的发展概况、其赖以发展的技术基础、特点、应用前景;嗣后,重点评述场致发射理论及发射极(阴极)制造技术的研究现状;真空微电子器件的制造技术现状;真空微电子技术的应用;最后给出了结论。First, this paper briefly discusses development survey of vacuum microelectronics technology, dependence of its development on technology base, characteristic, application prospects. Second, review will centre on theory of field emission and research present condition of manufacturing technology for emitter, present condition of manufacturing technology for vacuum microelectronics devices, application of vacuum microelectronics technology.

关 键 词：真空电子技术 微电子技术 研究 

分 类 号：TN1[电子电信—物理电子学]