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作 者:袁野[1] 曹钟慧[1] 鲍俊峰[1] 邹勇卓[1] 吴兴坤[1]
机构地区:[1]浙江大学现代光学仪器国家重点实验室,光及电磁波研究中心杭州310027
出 处:《光子学报》2004年第4期439-442,共4页Acta Photonica Sinica
摘 要:一种基于微细电火花加工 (EDM)技术的非硅基MEMS可调光衰减器 ,以电磁线圈驱动微反射镜 本文介绍该器件特性测试及动态响应分析 ,结果表明 ,驱动电压为 0~ 8V ,工作范围 0~35dB ,动态响应时间为 2ms ,插入损耗小于 0 .8dB ,回波损耗小于 - 5 0 .A novel non silicon based MEMS variable optical attenuator (VOA) is reported. The VOA is comprised of an EDM micro machined MEMS structure, in which a miniature mirror is driven electro magnetically to adjust desired attenuation continuously. The device features an attenuation ranging from 0 to 35 dB corresponding to a controlling voltage of 0~8 V. A response time of 2 ms was measured for the working range and a theoretical analysis of the VOA dynamic response was conducted. A reasonable agreement was obtained between measurement and calculated response time.
关 键 词:可调光衰减器 电火花加工 动态响应 插入损耗 光纤通信 回波损耗
分 类 号:TN715[电子电信—电路与系统] TN929.11
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