等离子体隐身技术的研究  

Study on Plasma Stealth Technology

作　　者：赵青[1] 李宏福[1] 任同[2] 鄢阳[1] 罗勇[1] 

机构地区：[1]电子科技大学物理电子学院,成都610054 [2]西南科技大学制造科学与工程学院,四川绵阳621010

出　　处：《电子科技大学学报》2004年第2期142-145,共4页Journal of University of Electronic Science and Technology of China

摘　　要：等离子体隐身是一种全新的隐身技术。建立等离子体隐身的基本模型,分别从折射效应和吸收衰减两方面论述了等离子体隐身的基本原理,通过理论分析和数值模拟,计算了电磁波等离子体中的衰减与等离子体碰撞频率、电磁波频率、等离子体厚度的关系。并对实现等离子体隐身进行研究,结果表明利用等离子体对雷达波隐身是可行的。Stealth technology is the high technology of the national defenses focused by countries over the word. Plasma stealth is a new type of stealth technology. In this paper, the physic model of the plasma stealth is built up. Two different basic theories for plasma stealth are showed, one is refraction, and the other is the absorption attenuation. The relation between the attenuation of electromagnetic waves and the plasma collision frequencies, the electromagnetic wave frequencies, the plasma thickness is studied. And the result of calculating simulation show the plasma stealth technique is a feasible method.

关 键 词：等离子体隐身 折射效应 吸收衰减 等离子体 

分 类 号：O539[理学—等离子体物理]