原位反射率测量在制备金刚石X光窗口上的应用  

In-situ reflectivity measurement in the fabrication of diamond X-ray windows

作　　者：骆金龙[1] 应萱同[1] 陈良尧[1] 

机构地区：[1]复旦大学信息学院光科学与工程系先进光子学材料与器件国家重点实验室,上海200433

出　　处：《核技术》2004年第4期247-250,共4页Nuclear Techniques

基　　金：国家自然科学基金(60178031)资助

摘　　要：通过反射率的原位测量和曲线拟合,研究了薄膜的生长过程并实时确定了它的光学性质。研究的结果与扫描电子显微镜(SEM)照片、X射线衍射(XRD)和α-step表面轮廓等非原位测试的结果符合良好。应用该研究成果,成功地制备了一种通光直径为4—8mm的无依托超薄金刚石X光高透射率窗口。样品测试完毕后均完好无损,显示了其低吸收和抗高辐射的良好特性。The multiple beam interference of the laser reflectance is a conventional method used to monitor the growth of thin films. In this paper we present the application of this method for the fabrication of diamond X-ray windows. The growth process and optical properties were studied in real time by in-situ reflectivity measurement and curve fitting. The research results are in good agreement with the measurement results of the SEM, XRD and α-step surface outline. Using the research results, we fabricate a type of Φ4-8 mm backing-free X-ray windows with high transmission successfully. The transmission was measured at Beijing Synchrotron Radiation Facility (BSRF)of the Chinese Academy of Sciences. The samples remained undamaged after the transmission measurement, therefore, the windows showed the distinct advantages of low absorption and strong radiation resistance.

关 键 词：CVD金刚石 原位 反射率 软X光 透射率 

分 类 号：O484[理学—固体物理] TB34[理学—物理]