半导体工业废水中除砷的研究  

Study of the Removal of Arsenic in Waste Waters from Compound Semiconductor Manufacturing

作　　者：韩利军[1] 崔育倩[1] 骆德馨[1] 余季金[1] 马玉新[1] 

机构地区：[1]青岛大学环境科学系,山东青岛266071

出　　处：《青岛大学学报（工程技术版）》2004年第1期87-92,共6页Journal of Qingdao University(Engineering & Technology Edition)

摘　　要：砷、镓、铟等有毒重金属元素作为半导体工业的主要原料,在加工使用过程中部分被当作废弃物而排放到工业废水中,如果这些废水不经处理就直接排放到环境当中去就会污染自然环境,给动植物以及人类造成危害。利用氢氧化钙和硫酸铁作为混凝剂对原始废水进行混凝沉淀,用膨润土、活性炭和有机剂作为吸附剂对沉淀后的上清液进行吸附沉淀等方法,对半导体工业废水中的砷作了有效去除的研究,并得到了相关方法的除污效率,在进行最佳化组合以后,得到了经济且有效的去除方法和药剂组合。As a consequence of more stringent environmental legislation being applied in China, traditional ways of arsenic waste treatment no longer became acceptable. For this reason it has been necessary to develop a cheap and effective method for processing arsenic water which was accumulating in the process of etching, cutting and washing in compound semiconductor industry. A substantial part of the problem to be solved was to reach a compromise between reasonable operation costs of technology and sufficient long-term stability of the disposable product. The proposed method of arsenic stabilization together with the other toxic elements present was based on progressive reduction of their solubility by a series of precipitation and solidification agents. The residual of arsenic after precipitation and solidification was removed by the adsorption of bentonite, organic adsorbent and active carbon.

关 键 词：半导体 工业废水 砷 吸附 混凝沉淀 镓 铟 废水处理 

分 类 号：X703[环境科学与工程—环境工程]