液晶投影显示复眼照明的容差模拟分析  

Tolerance Analysis for Fly′s eye Illumination System of LCLV Projector

作　　者：郑臻荣[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,杭州310027

出　　处：《光子学报》2004年第5期593-597,共5页Acta Photonica Sinica

基　　金：国防预研项目 (6 6 5 1 )支持

摘　　要：介绍了液晶投影显示复眼照明的工作原理 ,采用扩展 4× 4矩阵模型描述了复眼照明 ,以能量利用率和照明均匀性作为系统的评价标准 ,对复眼透镜的制造误差和位置误差进行计算机模拟分析 ,分析表明 ,双排复眼透镜相对位置误差对系统性能影响大于加工误差 ,而第一排复眼透镜的加工误差对能量利用率的影响大于第二排复眼透镜 。Fly′s eye illumination system provided high optical efficiency and super uniformity for large area illumination, especially for LCLV Projector. In this paper, 4×4 extended matrix model was introduced for system, and optical efficiency and uniformity of illumination system were analyzed by extended matrix and optical eikon. Simulation software was constructed under extended matrix model, and different tolerance of manufacture error and position error of fly′s eye illumination system was analyzed. By simulation, position error of fly′s eye has stronger influence in system performance than that of manufacture error, and the manufacture error of the first fly′s eye has stronger influence in the optical efficiency of the system, the manufacture of the second fly′s eye has stronger influence in the uniformity of illumination system.

关 键 词：复眼照明系统 扩展4×4矩阵 容差分析 

分 类 号：O439[机械工程—光学工程] TN946[理学—光学]