活性单体对聚氨酯丙烯酸酯混杂体系感度的影响  

Effect of reactive monomers on photosensitivity of polyurethane acrylate hybrid UV-curing system

作　　者：孙芳[1] 曾宪玉[2] 张文政[3] 黄毓礼[2] 

机构地区：[1]北京化工大学理学院,北京100029 [2]北京化工大学材料科学与工程学院,北京100029 [3]沈阳化工学院材料科学与工程学院,沈阳110142

出　　处：《北京化工大学学报（自然科学版）》2004年第2期66-68,共3页Journal of Beijing University of Chemical Technology(Natural Science Edition)

基　　金：国家自然科学基金资助项目 (2 9776 0 0 2 ) ;北京化工大学青年教师科研基金资助项目 (QN0 1 35 )

摘　　要：双官能度自由基型活性单体TEGDA在聚氨酯丙烯酸酯PU与环氧化合物EPON 81 2组成的混杂光固化体系中质量比为m(TEGDA)∶m(PU) =1∶2时 ,体系综合性能好 ,感度较高 ,感度值为 1 5 2J/m2 ,带有叔胺结构的活性稀释单体NVP的加入不利于提高混杂体系的感度 ,其感度值为 1 96 6J/m2 。混杂光固化体系中活性单体的选择 。When the weight ratio of triethyleneglycol diacrylic ester (TEGDA) to polyurethane acrylate oligomer (PU) was 1∶2,the photosensitivity of the hybrid UV curing system composed of PU and epoxy compound EPON 812 was amplified and the value of photosensitivity was 15 2?J/m 2. Addition of N Vinylpyrrolidone (NVP),the radical reactive monomer with tert amine group,decreased the photosensitivity of the hybrid system and the value of photosensitivity was 196 6?J/m 2. The effect of the reactive monomers on radical and cationic polymerization in the hybrid UV curing system should be considered simultaneously.

关 键 词：聚氨酯丙烯酸酯 光固化 混杂 

分 类 号：TQ57[化学工程—精细化工]