微粒场远场同轴全息术  

Far-field in-line holography of particle fields

作　　者：赖天树[1] 余昌旋 项志遴[1] 谭玉山[2] 

机构地区：[1]中国科技大学近代物理系,合肥230026 [2]西安交通大学机械工程系,西安710049

出　　处：《光学学报》1992年第8期742-748,共7页Acta Optica Sinica

摘　　要：本文从一般模型出发,导出了微粒场远场同轴全息图和再现实象面上的光强分布的普遍表达式.给出了全息图条纹对比度、记录介质的分辨率要求和可允许的微粒最大位移的普遍公式.完善和普遍化了微粒场同轴全息术的理论体系.The universal expresses of irradiance intensity distribution on the hologram and the reconstructed real image plane are derived from a general model of in-line holography of particle fields in this paper. The universal formulae of the fringe visibility, film resolution requirement and maximum allowable displacement of a particle are given. The theoretical system of in-line hologram of particle fields is perfected and universalized.

关 键 词：同轴 全息术 微粒场 远场 

分 类 号：TB877.1[一般工业技术—摄影技术]