电子束辐照聚酰亚胺薄膜的热刺激电流研究  

THERMALLY STIMULATED CURRENT INVESTIGATION OF POLYIMIDE FILMS IRRADIATED BY ELECTRON BEAM

作　　者：王玉芬[1] 曹晓珑[1] 刘耀南[1] 

机构地区：[1]西安交通大学

出　　处：《辐射研究与辐射工艺学报》1992年第3期182-186,共5页Journal of Radiation Research and Radiation Processing

摘　　要：报道用热刺激电流研究聚酰亚胺薄膜受电子束辐照前后试样中陷阱密度的变化,并对这些试样进行了介电性能的研究。通过不同辐照剂量下相应的热刺激电流表示了陷阱密度的变化与辐照剂量的关系。在75℃时热刺激电流(TSC)曲线出现一显著的电流峰,峰值位置与辐照剂量无明显关系。实验表明辐照使各个能级下的陷阱密度均匀变化,并与辐照剂量成指数关系。介质损耗因数随辐照剂量增加而升高。当辐照剂量为5×10~6Gy时,陷阱密度和介质损耗因数均出现反常变化。The variation of trap densities in polyimide films with the irradia-tion dose are investigated by TSC, together with the study of the dielectric property.At 75℃ a TSC peak appears, and the peak position has no obvious relation withthe irradiation dose. It is found that the trap densities at each energy depth varieshomogeneously with the action of irradiation. and increases exponentially with the ab-sorbed dose. At the same time the die1ectric dissipation factor increases with the dose.However, an extraordinary change is seen at the dose of 5×10~6 Gy.

关 键 词：辐照 热刺激电流 聚酰亚胺 薄膜 

分 类 号：O631.34[理学—高分子化学]