Fe-Ni合金薄膜的结构和磁性  

Studies on preparation and magnetic properties of Fe-Ni films

作　　者：李晓红[1] 杨正[1] 

机构地区：[1]兰州大学磁性材料研究所,兰州730000

出　　处：《物理学报》2004年第5期1510-1515,共6页Acta Physica Sinica

摘　　要：用射频磁控溅射制备了Fe_Ni薄膜 ,研究了薄膜成分、溅射条件及热处理温度对薄膜结构和磁性的影响 .通过选择适当的溅射条件和热处理温度 ,可得到适合于磁头材料应用的高饱和磁化强度的Fe_Ni软磁薄膜 .Fe-Ni films were deposited by radio frequency (RF) magnetron sputtering. The influence of composition, RF input power, argon pressure, substrate-to-target distance on the magnetic and structural properties of the films was investigated. x-ray diffraction measurements indicated that the films had the fcc structure and exhibited a dominant (111) orientation. The maximum saturation magnetization (M s～1.27×10 6A/m) can be obtained for films with the composition of Fe 54.5Ni 45.5. Depending on deposition conditions, the film coercivity could be varied from 80 to 640 A/m. After annealing at 400℃ for an hour, the particles grew bigger, the films orientation did not change obviously, still showing (111) orientation,and the coercivity decreased. After annealing, the optimal magnetic properties can be obtained in the films as follows: the saturation magnetization M s～1.27×10 6A/m, the easy axis coercivity of less than 160A/m, and the hard axis coercivity of less than 80 A/m.

关 键 词：铁-镍合金薄膜 磁头材料 磁性存储材料 结构分析 磁学性质 

分 类 号：O484.4[理学—固体物理]