用于制备纳米多层膜的金属掩膜法的研究  

Study on metallic mask method for preparing nano-multilayers

作　　者：由臣[1] 赵燕平[1] 孙永昌[1] 王玉红[1] 刘技文[1] 

机构地区：[1]天津理工学院材料科学与工程系,天津300191

出　　处：《兵器材料科学与工程》2004年第3期44-45,共2页Ordnance Material Science and Engineering

基　　金：天津市高等学校科技发展基金(01-20216)

摘　　要：简介了现有金属腌膜法制备纳米多层膜的过程,指出采用定位图形套准模板存在的弊端,研制出采用定位框固定基片、套准模板的制备新方法及装置。试验表明,采用该方法可显著提高制备纳米多层膜的完好率及套准精度。The existing process of preparing nano - multileyers using metallic mask method is briefly introduced, the short- comings of aligning patterns using located figures were pointed out. A new preparing way and divice was given out. The testing results show that the intact rate of nano - multilayers and the aligning accuracy were improved obviously by adopting the way.

关 键 词：纳米多层膜 定位框 套准 模板 

分 类 号：TB383[一般工业技术—材料科学与工程] TH161.1[机械工程—机械制造及自动化]