胶体五氧化二锑胶粒大小与分布的影响因素及其稳定性  

Size and distribution and its stability of colloidal Sb_2O_5 particle prepared by refluxing oxidation with hydrogen perovide as oxidant

作　　者：张利[1] 陈文汨[1] 龚竹青[1] 汤家明[1] 

机构地区：[1]中南大学冶金科学与工程学院,长沙410083

出　　处：《中国有色金属学报》2004年第5期877-882,共6页The Chinese Journal of Nonferrous Metals

摘　　要：选择3种有机物作为稳定剂,采用双氧水回流氧化法制备胶体五氧化二锑,探讨了影响胶体粒子大小及分布的主要因素,并从Zeta电位的观点研究了胶体的稳定性。结果表明:稳定剂的种类及用量、反应温度、双氧水的用量及加入方式、反应物的固液比是影响胶体粒子大小及分布的主要因素。2号稳定剂的吸附作用、静电斥力作用及空间位阻效应导致胶体能稳定存放1a以上,等电点从pH=1.85向更酸性区移动,Zeta电位从-30mV变为-60mV。The colloid antimony pentoxide was prepared by refluxing oxidation with hydrogen peroxide as oxidant and three organic agents as stabilizer. The effects on colloidal particles' diameters and distributions were discussed. The colloidal stability was studied in the view of Zeta potential. The results show that the size and distribution of colloidal particles are strongly influenced by the addition of stabilizers, reaction temperature, amount of hydrogen peroxide and its adding methods and ratio of reactive solid to liquid. The strong adsorption of stabilizer No.2 on surface of Sb_2O_5, the electric repulsive force and the steric stabilization energy make colloid Sb_2O_5 stable at least one year, the colloidal isoelectric point switchs from pH=1.85 to the more acidic field and Zeta potential from -30 mV to -60 mV.

关 键 词：胶体五氧化二锑 稳定剂 粒子大小及分布 等电点 ZETA电位 

分 类 号：TQ135.3[化学工程—无机化工]