THEORY DEPOSITION MODEL AND INFLUENCING FACTORS DURING PROCESS OF PREPARING MICRO-LAYER LAMINATE BY EBPVD  

THEORY DEPOSITION MODEL AND INFLUENCING FACTORS DURING PROCESS OF PREPARING MICRO-LAYER LAMINATE BY EBPVD

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作  者:L.P.Shi X.D.He Y.Li 

机构地区:[1]Center for Composite Materials, Harbin Institute of Technology,Harbin 150001, China,Center for Composite Materials, Harbin Institute of Technology,Harbin 150001, China,Center for Composite Materials, Harbin Institute of Technology,Harbin 150001, China

出  处:《Acta Metallurgica Sinica(English Letters)》2004年第3期283-287,共5页金属学报(英文版)

基  金:This work was supported by the Natural Science Foundation of Heilongjiang Province(No.E01-07);Postdoctoral Science Foundation of China(No.LB0047).

摘  要:This paper briefly introduces the characteristics of electron beam physical vapor depo-sition (EBPVD) technique and the whole process of preparing micro--layer compositelaminate. And several major influencing factors are presented and discussed. It wasfound that residual gas pressure should be low enough to guarantee the unobstructedtransporfation of vapor steam and electron beam; the evaporation method and evapo-ration speed are up to the different vapor pressure deficit of compositions of raw mate-rials; and the substrate temperature could have great influence on the microstructureof the micro--layer laminates.This paper briefly introduces the characteristics of electron beam physical vapor depo-sition (EBPVD) technique and the whole process of preparing micro--layer compositelaminate. And several major influencing factors are presented and discussed. It wasfound that residual gas pressure should be low enough to guarantee the unobstructedtransporfation of vapor steam and electron beam; the evaporation method and evapo-ration speed are up to the different vapor pressure deficit of compositions of raw mate-rials; and the substrate temperature could have great influence on the microstructureof the micro--layer laminates.

关 键 词:micro-layer composite material EBPVD residual gas pressure evaporation method and speed substrate temperature 

分 类 号:TB33[一般工业技术—材料科学与工程] TB115[理学—数学]

 

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