与2型糖尿病胰岛素抵抗相关的皮质下脑体积和皮质厚度改变  

Altered Subcortical Brain Volume and Cortical Thickness Related to Insulin Resistance in Type 2 Diabetes Mellitus

作　　者：吕志强 杜丽坤[2] 

机构地区：[1]黑龙江中医药大学第一临床医学院,黑龙江 哈尔滨 [2]黑龙江中医药大学附属第一医院内分泌二科,黑龙江 哈尔滨

出　　处：《临床医学进展》2024年第11期342-349,共8页Advances in Clinical Medicine

摘　　要：目的:本研究的目的是通过应用形态测量技术检查被诊断患有2型糖尿病(T2DM)的个体皮质下脑体积和皮质厚度的变化,此外,还调查这些修饰与胰岛素抵抗(IR)之间的潜在关联。材料和方法:本横断面研究共包括121名参与者(n = 48名健康对照[HCs]和n = 73名T2DM患者),他们被招募并接受了一系列认知测试和结构磁共振成像(MRI)。FreeSurfer用于处理MRI数据。协方差分析比较了T2DM和HCs之间皮质厚度和皮质下脑体积的差异,调整了性别、年龄、教育和体重指数(BMI)的潜在混杂效应。探索性偏相关调查了T2DM参与者IR与大脑结构之间的联系。结果:与HCs相比,T2DM患者表现出右尾额中回、右鳃盖骨、左中央前回和双侧额上回的皮质厚度减少。此外,这项针对T2DM的研究发现,IR的严重程度与左壳核和左海马体的体积以及左眶骨部、左钙质周围、右内嗅区和右喙前扣带回的厚度呈负相关。结论:观察到T2DM大脑结构变化的证据,皮质厚度的变化集中在额叶。IR和额叶皮质变薄之间的相关性可能作为T2DM的潜在神经影像学标志物,并导致各种与糖尿病相关的脑部并发症。Purpose: The objective of this study is to examine the alterations in subcortical brain volume and cortical thickness among individuals diagnosed with Type 2 diabetes mellitus (T2DM) through the application of morphometry techniques and, additionally, to investigate the potential association between these modifications and insulin resistance (IR). Materials and Methods: The present cross-sectional study comprised a total of 121 participants (n = 48 with healthy controls [HCs] and n = 73 with T2DM) who were recruited and underwent a battery of cognitive testing and structural magnetic resonance imaging (MRI). FreeSurfer was used to process the MRI data. Analysis of covariance compared discrepancies in cortical thickness and subcortical brain volume between T2DM and HCs, adjusting for the potential confoundi

关 键 词：脑容量 皮质厚度 胰岛素抵抗 结构磁共振成像 2型糖尿病 

分 类 号：R58[医药卫生—内分泌]