电化学沉积制备的纳米级高熵合金薄膜及其理化性能  

A Nanoscale High-Entropy Alloy Thin Film Fabricated by Electrochemical Deposition and Its Physicochemical Properties

作　　者：周杰[1] 孙萍 王雪 谢佳珈 

机构地区：[1]成都信息工程大学光电工程学院,四川 成都

出　　处：《物理化学进展》2023年第2期140-146,共7页Journal of Advances in Physical Chemistry

摘　　要：高熵合金(High-entropy alloys, HEAs)表现出有趣的理化特性。然而,制备纳米级的HEA薄膜仍然是一个挑战。在此,我们在水溶液体系中使用单步电化学沉积方法,制备了一种Fe-Co-Ni-Cu-Zn高熵合金薄膜。并使用XRD和SEM-EDS技术研究制备薄膜的微观形貌和晶体结构,表征发现五种金属元素实现了共沉积,元素分布均匀,组成薄膜形态大小在200~550 nm,并形成了单一的面心立方(FCC)固溶相结构。同时薄膜还具备典型的软磁性特征(饱和磁化强度为23.22 emu/g,矫顽力为90 Oe)和电学性能(电阻率为4.67 mΩ·cm)。这项研究为基于电化学技术的高性能HEA的简便制备提供了有效途径,同时也证明了HEA在磁性和电气方面具有各种潜在的应用。High-entropy alloys (HEAs) exhibit interesting physicochemical properties. However, it is still challenging to prepare nanoscale HEA film. Herein a simple electrochemical co-deposition method was carried out in an aqueous system to prepare Fe-Co-Ni-Cu-Zn HEA film. The XRD and SEM-EDS techniques are applied to investigate the crystalline and surface element distribution. All five elements are deposited, forming a singleface-centered cubic (FCC) phase structure with particle sizes ranging from 200 to 550 nm. The films also have typical soft magnetic characteristics (saturation magnetisation strength of 23.22 emu/g and coercivity of 90 Oe) and electrical properties (resistivity of 4.67 mΩ∙cm). This study provides an effective pathway for facile preparation of high-performance HEAs based on electrochemical technology, and also proves that HEAs as candidate magnetic and electrical materials have various potential applications.

关 键 词：电化学技术 电化学沉积 软磁性 高熵合金 饱和磁化强度 水溶液体系 面心立方 共沉积 

分 类 号：TG1[金属学及工艺—金属学]