Optimization of Diffraction Efficiency and Polarization Dependence Loss in Photopolymer Grating for Use in Multichip Module  

作　　者：Lingaraj Sahu J. Surya Narayana Achary Sukanta Kumar Tripathy 

机构地区：[1]Ganjam College, Berhampur, Odisa, India [2]National Institute of Science and Technology, Berhampur Odisa, India [3]Sanjaya Memorial Institute of Tehonology, Berhampur, Odisa, India

出　　处：《Journal of Modern Physics》2012年第9期1009-1012,共4页现代物理（英文）

摘　　要：We in this paper propose a model to increase the diffraction efficiency of a holographic grating at 1550 nm for multiplexing application. To use such a grating, polarization dependence loss is introduced analytically and then optimized for its minimum value A configuration of holographic grating is proposed based on both maximum diffraction efficiency and minimum polarization dependence loss. The proposed grating is expected to find importance in optoelectronic multichip module.We in this paper propose a model to increase the diffraction efficiency of a holographic grating at 1550 nm for multiplexing application. To use such a grating, polarization dependence loss is introduced analytically and then optimized for its minimum value A configuration of holographic grating is proposed based on both maximum diffraction efficiency and minimum polarization dependence loss. The proposed grating is expected to find importance in optoelectronic multichip module.

关 键 词：MULTIPLEXING DEMULTIPLEXING MODULATION Index 

分 类 号：O43[机械工程—光学工程]