Recovery Method of Pyrolytic Carbon Surface after Exposure to Chlorine Trifluoride Gas  

作　　者：Masaya Hayashi Keisuke Kurashima Hitoshi Habuka Akio Ishiguro Shigeaki Ishii Yoshiaki Daigo Hideki Ito Ichiro Mizushima Yoshinao Takahashi Masaya Hayashi;Keisuke Kurashima;Hitoshi Habuka;Akio Ishiguro;Shigeaki Ishii;Yoshiaki Daigo;Hideki Ito;Ichiro Mizushima;Yoshinao Takahashi(Yokohama National University, Hodogaya, Yokohama, Japan;NuFlare Technology, Inc., Yokohama, Japan;KANTO DENKA KOGYO CO., LTD., Marunouchi Chiyoda, Tokyo, Japan)

机构地区：[1]Yokohama National University, Hodogaya, Yokohama, Japan [2]NuFlare Technology, Inc., Yokohama, Japan [3]KANTO DENKA KOGYO CO., LTD., Marunouchi Chiyoda, Tokyo, Japan

出　　处：《Advances in Chemical Engineering and Science》2021年第1期65-76,共12页化学工程与科学期刊（英文）

摘　　要：An annealing process was developed for the practical recover of a purified py-rolytic carbon (PPyC) surface from damage, such as color change and peeling, due to fluorination during exposure to chlorine trifluoride gas at high tempera-tures for the cleaning of a silicon carbide chemical vapor deposition reactor. The PPyC surface was annealed at 900</span><span style="color:#4F4F4F;font-family:Verdana;">&#176;</span><span style="font-family:Verdana;"></span><span style="font-family:Verdana;">C for 10 min in ambient nitrogen con-taining oxygen at the concentrations of 0.01% - 20%. The rainbow-like colored surface returned to the dark gray color of the original PPyC. Simultaneously, the thin peeled films disappeared. The Raman spectra showed that the PPyC surface chemical bonding returned to that of the original one. The oxygen concentration as low as 0.01% could recover the PPyC surface along with re-ducing the surface pit formation, when the combination of the exposure to chlorine trifluoride gas and the recovery was repeated.An annealing process was developed for the practical recover of a purified py-rolytic carbon (PPyC) surface from damage, such as color change and peeling, due to fluorination during exposure to chlorine trifluoride gas at high tempera-tures for the cleaning of a silicon carbide chemical vapor deposition reactor. The PPyC surface was annealed at 900</span><span style="color:#4F4F4F;font-family:Verdana;">&#176;</span><span style="font-family:Verdana;"></span><span style="font-family:Verdana;">C for 10 min in ambient nitrogen con-taining oxygen at the concentrations of 0.01% - 20%. The rainbow-like colored surface returned to the dark gray color of the original PPyC. Simultaneously, the thin peeled films disappeared. The Raman spectra showed that the PPyC surface chemical bonding returned to that of the original one. The oxygen concentration as low as 0.01% could recover the PPyC surface along with re-ducing the surface pit formation, when the combination of the exposure to chlorine trifluoride gas and the recovery was repeated.

关 键 词：Pyrolytic Carbon Recovery Chlorine Trifluoride Fluorine Out-Diffusion ANNEALING 

分 类 号：TG1[金属学及工艺—金属学]