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作 者:Clyde Varner II Angela Davis Leslie Wilson Padmaja Guggilla Clyde Varner II;Angela Davis;Leslie Wilson;Padmaja Guggilla(Department of Physics, Chemistry and Mathematics, College of Engineering, Technology and Physical Sciences, Alabama A&M University, Normal, AL, USA;Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, USA)
机构地区:[1]Department of Physics, Chemistry and Mathematics, College of Engineering, Technology and Physical Sciences, Alabama A&M University, Normal, AL, USA [2]Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, USA
出 处:《Journal of Minerals and Materials Characterization and Engineering》2024年第6期334-345,共12页矿物质和材料特性和工程(英文)
摘 要:This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.
关 键 词:MPCVD (Microwave Plasma Chemical Vapor Deposition) Raman Spectroscopy Steel Alloys (316L 4140 1018) Coatings Chip-Resistance
分 类 号:TG1[金属学及工艺—金属学]
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