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作 者:Eytan Barouch Stephen L. Knodle Steven A. Orszag
机构地区:[1]Department of Mathematics, Yale University, New Haven, USA [2]Department of Mechanical Engineering, Boston University, Boston, USA
出 处:《Modeling and Numerical Simulation of Material Science》2013年第3期1-7,共7页材料科学建模与数值模拟(英文)
摘 要:A method has been designed and implemented to describe the optical properties of lossy materials as a continuous functions of a finite wave length spectrum, needed in analysis of the Maxwell-Material equations. Measurements of the index of refraction (N) and the absorption coefficient (K) over a limited spectral range are used as input data. The (complex) permittivity function is then represented as a sum of five types of terms: a plasma term, a conductivity term, several Debye poles, several symmetric Lorentz poles as well as several asymmetric extended Lorentz (“XLorentz”) poles. All these terms are particular solutions of the Lifshitz integral equation describing the dispersion relation of a mono-chromatic electromagnetic wave. This representation facilitates the numerical solution of broadband direct and the inverse scattering of electromagnetic waves for thin film stacks and composite physical structures, in particular those now employed by the microchip industry.A method has been designed and implemented to describe the optical properties of lossy materials as a continuous functions of a finite wave length spectrum, needed in analysis of the Maxwell-Material equations. Measurements of the index of refraction (N) and the absorption coefficient (K) over a limited spectral range are used as input data. The (complex) permittivity function is then represented as a sum of five types of terms: a plasma term, a conductivity term, several Debye poles, several symmetric Lorentz poles as well as several asymmetric extended Lorentz (“XLorentz”) poles. All these terms are particular solutions of the Lifshitz integral equation describing the dispersion relation of a mono-chromatic electromagnetic wave. This representation facilitates the numerical solution of broadband direct and the inverse scattering of electromagnetic waves for thin film stacks and composite physical structures, in particular those now employed by the microchip industry.
关 键 词:SCATTERING Inverse SCATTERING Silicon-Material-Properties MATERIAL Electric PERMITTIVITY
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