掩模版标准现状与发展方向  

Current Status and Development Direction of Mask Standards

作　　者：曹可慰 吴怡然 张军华 李其聪 CAO Ke-wei;WU Yi-ran;ZHANG Jun-hua;LI Qi-cong(China Electronics Standardization Institute)

机构地区：[1]中国电子技术标准化研究院

出　　处：《标准科学》2022年第S01期91-95,共5页Standard Science

摘　　要：掩模版,也称光罩,是集成电路制造中光刻工艺所使用的图形母版,由不透明的遮光薄膜在透明基板上形成掩模图形,并通过曝光将图形转印到产品基板上,是光刻工艺中最重要的耗材之一,其质量很大程度上决定了集成电路最终产品的质量。掩模版是高度标准化的产品,目前我国掩模版标准化工作还处于起步阶段。随着我国产业的发展壮大,为掩模版标准填补空白创造了条件。本文从掩模版产业体系发展现状和趋势出发,结合标准现状梳理分析,提出了掩模版标准成体系化发展的思路和建议。Mask is the graphic master used in the lithography process in the manufacturing of integrated circuits.Mask transfers the pattern that formed on the opaque film on the surface of mask transparent substrate to the product through exposure.It is one of the most important materials used in the lithography process,and its quality influences the quality of integrated circuits a lot.Mask is a highly standardized product.At present,the standardization of mask in China is still in its infancy.With the development and expansion of China’s semiconductor industry,there is an opportunity for the development of mask standardization.This paper investigates the development status and trend of the mask industry,analyzes the existing standards,and proposes suggestions for the systematic development of mask standards.

关 键 词：掩模版 掩模基板 标准 标准体系 

分 类 号：TN405[电子电信—微电子学与固体电子学]