SED的磁控溅射法制作技术试验研究  

Research on SED Fabrication with Magnetron Sputtering

作　　者：孙宏博[1] 吴胜利[1] 张劲涛[1] 

机构地区：[1]西安交通大学电子物理与器件教育部重点实验室,陕西西安710049

出　　处：《真空电子技术》2008年第2期30-33,共4页Vacuum Electronics

摘　　要：介绍了表面传导电子发射显示(SED),采取了一种使用PdO膜和ZnO膜磁控溅射制作SED的方法,它具有发射均匀的优点。SED器件的电极厚度、导电膜材料、导电膜宽度对发射性能有很大影响,文中对这些参数进行了讨论。通过参数的优化,得到了稳定、均匀的电子发射。A novel method for fabrication of the surface-conduction electron-emitter display (SED) with magnetron sputtering is demonstrated, which has the advantage of uniform. Parameters include thickness of device electrodes, materials and width of the conducting film which influent the performance of SED are discussed. Through optimization of these parameters, stable and uniform electron emission has been obtained.

关 键 词：表面传导电子发射显示器 磁控溅射 导电膜 

分 类 号：TN873[电子电信—信息与通信工程]