单晶片离子注入机垂直扫描机构差分密封的设计  

Design of the Differential Vacuum Seal for the Vertical Scanner of Series Process Ion Implanter

作　　者：胡代群[1] 刘求益[2] 

机构地区：[1]湘潭大学机械工程学院,湖南湘潭411105 [2]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《真空电子技术》2007年第2期38-40,44,共4页Vacuum Electronics

摘　　要：对垂直扫描机构差分式密封进行了设计和计算。差分式密封是非接触动密封,垂直扫描机构中,轴和轴套之间有微小的间隙,轴套上有两级差分抽气室,通过微小的间隙和两级差分抽气室,密封气体被两级真空泵抽出。这种密封能实现无摩擦、性能好的密封,能最大程度满足晶片处理过程中对靶室高真空度及金属颗粒的要求。A differential vacuum seal for the vertical scanner was calculated and designed in this article.The differential vacuum seal is non-contact type.In the vertical scanner there is a small gap between the shaft and sleeves,and two stages outgoing gas grooves are formed on the sleeves.Though the small gap and two stages outgoing gas grooves,the sealing gas can be pumped out by two stages pumps.This type of seal can achieve no-friction and good performance seal,hence it can meet the requirements of high vacuum without metal contaminate for the chamber in the wafer process.

关 键 词：离子注入机 扫描机构 差分密封 

分 类 号：TN105[电子电信—物理电子学]