多靶射频磁控共溅射SmCo/Cr薄膜的制备和磁性能  

Preparation and Properties of Smco/cr Films by RF magnetron Sputtering More Target Together

作　　者：章平[1] 黄致新[2] 张玉龙[1] 王辉[2] 张峰[2] 

机构地区：[1]郧阳师范高等专科学校物理系,湖北丹江口442700 [2]华中师范大学物理系,湖北武汉430079

出　　处：《咸宁学院学报》2006年第6期47-49,共3页Journal of Xianning University

摘　　要：采用多靶射频磁控共溅射方法制备了SmCo/Cr薄膜,用XRD和VSM测量了各样品的微结构和矫顽力.结果表明,SmCo膜具有较强的垂直各向异性,当Cr底层溅射时间为5min、SmCo磁性层溅射时间为14min、Co靶溅射功率为220W时,所得到的薄膜垂直矫顽力最大.SmCo/Cr thin film had prepared by magnetron sputtering more target together.The microstructure and coercive force of the samples were measured by using XRD and VSM.The results showed that origin in SmCo/Cr thin film is perpendicular magnetic anisotropy.When the sputtering time of Cr underlayer is 5min,the sputtering time of SmCo magneticlayer is 14 min,and the sputtering power of Co target is 220W,the coercive force of the thin film get maximum.

关 键 词：多靶共溅射 SmCo/Cr薄膜 矫顽力 

分 类 号：TM273[一般工业技术—材料科学与工程] TB43[电气工程—电工理论与新技术]