低温沉积ITO透明导电膜的研究  

Investigation of Sputting Coating ITO Transparent Electrconductive Film at Lower Temperature

作　　者：沈玫[1] 纪建超[1] 贺会权[1] 

机构地区：[1]北京航空材料研究院,北京100095

出　　处：《材料工程》2006年第z1期17-19,共3页Journal of Materials Engineering

摘　　要：通过探讨半导体氧化物ITO膜的透光和导电机理,用反应性直流磁控溅射的镀膜工艺,在有机玻璃上低温镀制(ITO)膜,研究ITO膜溅射工艺参数与透光和导电性能的关系,实现了在低温下镀制(ITO)膜的技术,其透光率≥80%以上,表面电阻≤30Ω/□。This paper described investigation of the transparency and electroconductive mechanism of semiconductive oxide ITO film,use reactive direct current magnetic control sputting coating process,to coating an ITO film on the acrylic glass at lower temperature.Investigtion the relationship between the sputting technological parameters and the transparent and electro conductive properties of the ITO film,realized the technological process to coating ITO film on the acrylic glass at lower temperature.The properties of the material are transparency ≥80%,surface resistence≤30Ω/□.

关 键 词：透明导电膜 ITO膜 磁控溅射 

分 类 号：O484[理学—固体物理]