直流磁控溅射磁性γ′-Fe_(4)N膜生长机理研究  

Growth Mechanism of Magnetic γ′-Fe_(4)N Thin Films Deposited by D.C. Magnetron Sputtering

作　　者：徐娓[1] 王欣[2] 冯守华[1] 郑伟涛[2] 田宏伟[2] 于陕升[2] 杨开宇[3] 

机构地区：[1]吉林大学化学学院无机合成与制备化学国家重点实验室 [2]吉林大学材料与工程学院 [3]吉林大学电子科学工程学院,长春130023

出　　处：《高等学校化学学报》2004年第7期1318-1321,MJ05,共5页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金(批准号:20121103)资助

摘　　要：采用直流磁控溅射法研究了磁控溅射沉积氮化铁薄膜的生长机制 ,并归属了其生长普适类型 .结果表明 ,磁控溅射法生长的薄膜表面具有自仿射分形特性 ,而且表面存在一定数量的空位或孔洞 ,粒子呈现悬臂沉积生长现象 .γ′-Fe4 N单相薄膜的生长指数 β≈ 0 .61± 0 .0 2 ,静态标度指数 α≈ 0 .5 7± 0 .2 0 ,各指数之间的关系为 α+α/ β≈ 2 ,薄膜生长属于A variety of natural and industrial dynamical processes, such as vapor deposition, spray painting, and chemical dissolution, lead to the formation of rough surfaces. In the light of dynamical scaling, the growth and formation of such rough interfaces can be researched. In this paper, we deposited Fe-N thin films on glass substrates at different temperatures and different time by DC magnetron sputtering in N 2/Ar atmosphere. The composition, structure and saturation magnetization of the films were investigated. The growth of the γ′-Fe 4N phase was also analyzed by using dynamic scaling. It is found that the surfaces of the Fe-N films typically exhibits self-affine structures both in space and time, and the 2-dependent nontrivial exponents are α≈0.57±0.20 and β≈0.61±0.02, respectively. The scaling relationship α+α/β≈2 is obeyed, which is in agreement with KPZ universality. The growth process allowed the formation of overhangs or voids, and desorption was the dominant relaxation process.

关 键 词：γ′-Fe_(4)N 生长普适类型 直流磁控溅射 磁性 

分 类 号：O614.811[理学—无机化学] O484[理学—化学]