紫外压印模版的制备  

Stamp Fabrication in UV Nano-imprint Lithography

作　　者：司卫华[1] 董晓文[1] 顾文琪[1] 

机构地区：[1]中国科学院电工研究所

出　　处：《微细加工技术》2007年第2期5-8,共4页Microfabrication Technology

摘　　要：概述了紫外压印的原理及其优点,并通过对紫外压印模版特殊性的分析,提出了两种紫外压印模版的制作。用反应离子刻蚀法制作了玻璃模版,用浇灌法制作了聚二甲基硅氧烷(PDMS)模版,最后给出了实验过程和结果。实验表明,用反应离子刻蚀法可以制作出具有100 nm特征尺寸、图形的深度为50 nm的玻璃模版,而且通过控制刻蚀时间可以得到需要的图形深度。用浇灌法可以制作出具有100 nm特征尺寸、图形深度为145 nm的聚合物模版。The principle and advantage of UV nano-imprint lithography were summarized. By analysis of the particularity of UV nano-imprint stamp, two fabrication methods of stamp were suggested, and the glass stamp and PDMS (Polydimethylsiloxane) stamp were fabricated by reaction ion etching (RIE) and pouring, respectively. The experimental results indicate that the glass stamp fabricated by RIE possesses a characteristic width of 100 nm and a deepness of 50 nm and the deepness can be controlled by etching time and the characteristic width and depth of the polymer stamp fabricated by pouring are 100 nm and 145 nm, respectively.

关 键 词：紫外线 压印 模版制作 反应离子刻蚀 

分 类 号：TN405[电子电信—微电子学与固体电子学]