中能离子注入机用静电吸盘  

Electrostatic Chuck in Medium Energy Ion Implanter

作　　者：肖仁耀[1] 孙雪平[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,长沙410111

出　　处：《微细加工技术》2007年第6期5-7,共3页Microfabrication Technology

摘　　要：简要介绍了静电吸盘的工作原理,理论分析了六相静电吸盘的工作模式,对静电吸盘进行了结构设计和制作工艺研究,并对静电吸盘的工艺性能尤其是静电吸盘在不同压力的氮气冷却性能进行了研究。实验结果表明,静电吸持电压的频率为30 Hz时最佳,这时电压一般为0.5 kV^1 kV,所需电源的功率较小。The operational principle of the electrostatic chuck was briefly introduced.The operational mode of the six-phase electrostatic chuck and concentrates its attention on the structural design and manufacturing process were theoretically analysed,especially the nitrogen cooling performance under different pressure conditions.It is showed that the best frequency of the electrostatic clamping voltage is 30 Hz,when the voltage is 0.5 kV to 1 kV and the required power is low.

关 键 词：静电吸附 六相静电吸盘 离子注入 

分 类 号：TN305.3[电子电信—物理电子学]