CVD复制技术制备ZnS头罩  

CVD replication for ZnS dome

作　　者：鲁泥藕[1] 霍承松[1] 付利刚[1] 石红春[1] 孙加滢[1] 杨海[1] 

机构地区：[1]北京有色金属研究总院北京国晶辉红外光学科技有限公司,北京100088

出　　处：《红外与激光工程》2007年第z2期133-135,共3页Infrared and Laser Engineering

摘　　要：为减轻生产、加工难度和减少材料浪费,提出了CVD复制技术制备ZnS头罩的方法。着重阐述了衬底和CVD过程对复制ZnS头罩的影响,并列举了复制ZnS头罩时衬底材料的要求。A chemical vapor deposition process has been used to replicated ZnS dome to alleviate the difficulties of production and machining and to reduce the waste of material.The paper emphases the influence of substrates and CVD process on ZnS dome replication.The paper also exemples the demands of substract for ZnS dome.

关 键 词：CVD复制 ZnS头罩 衬底 过程 

分 类 号：TN21[电子电信—物理电子学]