电子束蒸发方法制备ZnO薄膜的结构和光学特性研究  

Research On Structural and Optical Charactors of Preparation ZnO Pellicle By Using Electron Beam Transpiration Method

作　　者：马丛笑[1] 宁潜艳[1] 郑才平[1] 

机构地区：[1]哈尔滨师范大学物理系,黑龙江哈尔滨150080

出　　处：《哈尔滨商业大学学报（自然科学版）》2001年第3期31-32,共2页Journal of Harbin University of Commerce：Natural Sciences Edition

摘　　要：用电子束蒸发方法在硅衬低上制备ZnO薄膜,测量了ZnO薄膜的XRD谱,表明六角晶体结构的薄膜具有强C轴择优取向(002),并且,测量了ZnO薄膜样品的二次离子质谱(SIMS),表明其化学剂量比为1∶1。在光致发光实验中,用He-Cdi激光器的325nm(50mω)波长激发,观察到了385nm的紫外光发射。This paper has discussed on preparation ZnO pellicle on silicic underlay by using electron beam transpiration method,measured XRD of ZnO pellicle,indicated that the pellicle which have hexagonal crystal structure have strong tropism of c axis,furthermore,we measured SIMS of the ZnO samples,indicated the chemistry metric-ratio of it is1∶1.In the experiment of shining brought by lights,excitated by He-Cdi laser at325nm(50mω)wave length,we observed the ultraviolet radiation launching of 395nm.

关 键 词：电子束蒸发 光致发光 薄膜 X射线衍射(XRD) 

分 类 号：O484.4+1[理学—固体物理]