钛合金表面磁控溅射离子渗镀铜的烧蚀特性研究  

Ablation character of the titanium alloy surface by magnetron sputtering copper

作　　者：黄国青[1] 张高会[1] 乔宪武[1] 徐鹏[1] 李根[1] 

机构地区：[1]中国计量学院理学院,浙江杭州310018

出　　处：《中国计量学院学报》2010年第3期274-277,282,共5页Journal of China Jiliang University

基　　金：浙江省科技厅资助项目(No.2007C21139);国家青年基金资助项目(No.10802083)

摘　　要：针对一定条件下钛合金的易燃以及在双层辉光离子渗铜中铜源极易熔的问题,采用了磁控溅射的技术,在Ti6Al4V的表面进行铜元素的渗镀,形成的Ti-Cu阻燃合金层以提高其阻燃性能.研究溅射功率、溅射时间、工作气压等工艺参数对铜渗镀层厚度的影响后,发现0.6 Pa的工作气压、180 W的溅射功率、3 h的溅射时间为优化工艺参数.XRD结构分析表明,Ti6Al4V样品表面形成了含CuTi2相的合金层;激光烧蚀实验表明,钛合金渗铜层的阻燃性能提高了2倍以上,但表面纯铜薄膜层对阻燃性能没有帮助.To solve the problems that titanium alloy was combustible under certain conditions and that copper as the source was difficult to sputter by using double glow plasma surface alloying technology,Cu was permeated into the Ti6Al4V substrate by using magnetron sputtering technology and the Ti-Cu burn-resistant alloyed layer was formed on the surface of titanium alloy in order to enhance its burn-resistant properties.The effects of sputtering power,sputtering time,and gas pressure on the thickness of diffusion c...

关 键 词：钛合金 磁控溅射 渗铜 阻燃 

分 类 号：TG174.445[金属学及工艺—金属表面处理]