钛合金表面非平衡磁控溅射制备TiN薄膜的冲击磨损性能  

Impact Wear Performance of TiN Film Grown on Ti Alloys by Unbalanced Magnetron Sputtering

作　　者：王艳[1,2] 周仲荣[1] 

机构地区：[1]西南交通大学摩擦学研究所,成都6100312 [2]西华大学材料科学与工程学院,成都610039

出　　处：《中国表面工程》2010年第4期7-10,14,共5页China Surface Engineering

基　　金：国家自然科学创新研究群体科学基金资助(50821063);国家973计划(2007CB714704)

摘　　要：文中利用非平衡磁控溅射技术在Ti6Al4V合金表面沉积TiN薄膜。固定冲击频率、改变冲击载荷,在小载荷冲击磨损试验机上进行了系列周次的冲击磨损试验,用台阶仪、扫描电子显微镜、X射线衍射仪分析磨痕深度、形貌及相结构,并探讨了TiN薄膜的磨损机理。试验表明:TiN薄膜的冲击磨损机理主要为塑性变形和疲劳剥落,与基体材料作比较,TiN薄膜破坏的临界冲击周次比基体材料Ti6Al4V合金明显提高。TiN films were grown by unbalanced magnetron sputtering on Ti6Al4V. The impact wear tests of TiN films were carried out with a small load impact-wear testing machine by fixed-frequency and different impact-force. The depth, morphologies and phase structure of worn surface were characterized with surface profilometer, scanning electron microscope(SEM), X-ray diffraction (XRD), and the wear mechanism of the TiN films was discussed in detail. The results indicate the wear mechanism of the TiN films were plasti...

关 键 词：TIN薄膜 TI6AL4V合金 冲击磨损性能 磨损机理 

分 类 号：TG174.4[金属学及工艺—金属表面处理]