Electro-deposition tangsten coating on low activation steel substrates from Na_2WO_4-ZnO-WO_3 melt salt  

作　　者：Liu, Yanhong  Zhang, Yingchun  Liu, Qizong  Ge, Changchun 

机构地区：[1]School of Material Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China

出　　处：《Rare Metals》2012年第4期350-354,共5页稀有金属（英文版）

基　　金：supported by the International Thermonuclear Experimental Reactor (ITER) Project of China (No. 2010GB109000);the National Natural Science Foundation of China (No. 50972008)

摘　　要：Tungsten coating is considered as a promising alternative material for plasma facing materials(PFC) in future fusion devices.The electro-deposition of tungsten in Na_2WO_4-ZnO-WO_3 melt at 1173 K on low activation steel substrates was studied in this work.Adherent and smooth tungsten films were deposited under various pulsed current conditions.The crystal structure and microstructure of tungsten deposits were characterized by XRD,SEM and EDX techniques.The results show that pulsed current density and duty cycle have a significant influence on tungsten nucleation and electro-crystallization phenomena.Uniform and smooth tungsten coating with high purity and high adherence is obtained on low active steel substrates as cathodic current density ranges from 35 to 25 mA·cm_(-2).

关 键 词：TUNGSTEN ELECTRO-DEPOSITION low activation steel pulse current MELT 

分 类 号：TG174.4[金属学及工艺—金属表面处理]