金属铀表面非平衡磁控溅射CrN_x薄膜的XPS分析与腐蚀性能  

XPS Analysis and Corrosion Resistance of CrN_x Film Prepared by Unbalanced Magnetron Sputtering on Surface of Depleted Uranium

作　　者：朱生发[1] 刘天伟[2] 吴艳萍[1] 黄河[1] 江帆[1] 唐凯[1] 魏强[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900 [2]表面物理与化学重点实验室,四川绵阳621907

出　　处：《原子能科学技术》2012年第9期1128-1132,共5页Atomic Energy Science and Technology

基　　金：中国工程物理研究院发展基金资助项目(2009B0203019)

摘　　要：金属铀的化学性质十分活泼,极易发生氧化腐蚀。为改善基体的抗腐蚀性能,采用非平衡磁控溅射离子镀技术在金属铀表面制备CrNx薄膜。采用X射线衍射和X射线光电子能谱研究薄膜表面的物相结构和元素成分分布,采用极化曲线研究薄膜的抗腐蚀性能。结果表明,CrNx薄膜具有较好的致密性和抗腐蚀性能。当氮分压较小时,生成的薄膜为Cr+CrN+Cr2N混合相。在金属铀表面制备1层CrNx薄膜后,其腐蚀电位增大约465mV,腐蚀电流密度明显降低,有效改善了贫铀表面的抗腐蚀性能。The chemical nature of depleted uranium is very active and prone to oxidation corrosion in nature environment.In this study,CrNx film was prepared on the surface of depleted uranium by unbalance magnetron sputtering ion plating to improve its corrosion resistance.The X-ray photoelectron spectroscopy(XPS) was used to characterize the chemical state and depth profiles of Cr,N and O elements.XRD was employed to examine the phase structure of CrNx film.The corrosion behavior of the samples was measured by using polarization curves(E/I).The results show that CrNx film prepared by unbalance magnetron sputtering has good density and corrosion resistance.The phase composition of CrNx films is composed with Cr,CrN and Cr2N when the N2 flow is lower.After a layer of CrNx is deposited on the surface of uranium,the corrosion potential increases about 465 mV,while the corrosion current density decreases significantly.It is indicated that the corrosion resistance of depleted uranium is effectively improved after depositing CrNx thin film by unbalance magnetron sputtering.

关 键 词：贫铀 非平衡磁控溅射 腐蚀性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]