中国专利结构趋势分析  

Analysis of the Trend of China's Enterprise Patent Structure

作　　者：潘雄锋[1] 舒涛[1] 张维维[1] 

机构地区：[1]大连理工大学经济学院,辽宁大连116024

出　　处：《大连理工大学学报（社会科学版）》2012年第1期41-46,共6页Journal of Dalian University of Technology(Social Sciences)

基　　金：教育部人文社会科学研究基金项目(10YJC630187);中央高校基本科研业务费人文社科专题项目(DUT11RW304)

摘　　要：文章采用向量自回归模型对1985～2009年我国专利结构进行了实证分析。结果表明,我国发明专利、实用新型专利和外观设计专利之间存在紧密的内在联系,某一类专利的发展不仅与该专利前期的发展有关,而且还受到其他专利的影响,发明专利的重要性最为明显,不仅有利于促进本身而且还能促进另外两种专利的发展。要实现我国专利的快速发展,应保持专利政策的长期稳定,深入挖掘发明专利的潜力,充分发挥发明专利对其他专利的带动作用。By using the vector auto regressive model,the paper analyzes the trend of China's enterprise patent structure from 1985 to 2009.The results show that the invention patent,utility model patent and appearance design patent have a close inherent link.The development of a certain type of the patent is not only related to the preliminary development of the patent itself,but also related to the development of other patents,and the invention patent can be seen most clearly from the impulse response function,which will promote the development of itself and other two patents.For rapid growth of China enterprise patent,invention patent potentiality should be tapped to play its patent-driven function,based on long-term stability of the patent policy.

关 键 词：专利结构 向量自回归 脉冲响应函数 

分 类 号：F224[经济管理—国民经济] F204