锆离子轰击Zr-4的腐蚀行为及其慢正电子谱研究  

Corrosion Behavior of Zirconium-Ion Bombardment on the Zircaloy-4 and Investigation with Slow Positron Annihilation Spectroscopy

作　　者：彭德全[1] 白新德[1] 陈小文[1] 周庆刚[1] 刘晓阳[1] 邓平晔[1] 

机构地区：[1]清华大学材料科学与工程系,北京100084

出　　处：《核动力工程》2004年第4期361-365,共5页Nuclear Power Engineering

基　　金：国家自然科学基金(G2000067207-1)

摘　　要：为了研究锆离子轰击对Zr-4合金锆耐蚀性的影响,用金属蒸汽真空弧(MEVVA)源对纯锆样品进行了1?015 至2?017 cm-2 的锆离子轰击,加速电压为50 kV。用X-射线光电子谱(XPS)对轰击表面各元素进行价态分析;用俄歇电子能谱(AES)分析氧化膜厚度。对轰击样品进行3次极化测量,以评价轰击样品在1N 硫酸溶液中的耐蚀性。利用慢正电子谱研究了轰击样品表面的缺陷情况。研究结果表明:除1×1015cm-2剂量外,轰击样品的耐蚀性都好于空白Zr-4,且5×1016 cm-2离子轰击样品的耐蚀性最好,轰击样品的自腐蚀电位大体上随着剂量的增加而下降。轰击Zr-4样品的腐蚀行为与其慢正电子谱之间存在着一定的对应关系。In order to investigate the affect of Zr-ion bombardment on the corrosion resistance of zircaloy-4, specimens were bombarded by zirconium ions with a fluence range from 1×l015 to 2×l017 ions/cm2, using a MEVVA source at an extract voltage of 50 kV. The valence of the surface layer was analyzed by X-ray photoemission spectroscopy (XPS); the thickness of the oxide film was measured by Auger electron spectroscopy (AES). Three-sweep potentiodynamic polarization measurement was used to value the corrosion resistance of bombarded zirconium in a 1N H2SO4 solution. Slow positron annihilation spectroscopy (PAS) measurement was employed to obtain to the distribution of the implantation induced defects. A significant improvement of corrosion resistance was achieved compared with as-received zircaloy-4 except for 1×1015 Ions/cm2 fluence, and the sample with 5×106 ions/cm2 fluence is most anti-corrosive in all the samples. The natural corrosion potentials of bombarded samples decline with raising the bombarded fluences. It was found that there was some relationship between the corrosion behavior of Zr-ion bombarded zircaloy-4 and the slow positron annihilation spectroscopy (PAS).

关 键 词：ZR-4合金 耐蚀性 离子轰击 动电位极化 慢正电子谱 

分 类 号：TL341[核科学技术—核技术及应用]