Self-assembly structure formation on patterned InP surfaces  

作　　者：SU Ge1,2,CAO LiXin1 & LIU TianZhong3 1 Institute of Material Science and Engineering,Ocean University of China,Qingdao 266100,China 2 Nanoscale Physics Research Laboratory,School of Physics and Astronomy,the University of Birmingham,Edgbaston,Birmingham B15 2TT,UK 3 College of Food Science and Engineering,Ocean University of China,Qingdao 266003,China 

出　　处：《Science China(Technological Sciences)》2009年第9期2732-2736,共5页中国科学（技术科学英文版）

基　　金：Supported by the Notional Natural Science Foundation of China (Grant No. 50672089);the Encouraging Foundation for the Scientific Research of the Excel-lent Young and Middle-aged Scientists in Shandong Province of China (Grant No. 2006BS04034)

摘　　要：Self-assembly of polystyrene spheres guided by patterned n-type InP substrates has been investigated. InP surfaces were patterned using a variety of methods including wet chemical etching,sputter coating,thermal evaporation,and photo lithography. The self-assembly of polystyrene spheres depended on the appearance of patterns and was affected by the deposition techniques (sputter coating and thermal evaporation) of Au micro-squares. SEM and AFM were used to characterize the surface morphologies.Self-assembly of polystyrene spheres guided by patterned n-type InP substrates has been investigated. InP surfaces were patterned using a variety of methods including wet chemical etching, sputter coating, thermal evaporation, and photo lithography. The self-assembly of polystyrene spheres depended on the appearance of patterns and was affected by the deposition techniques (sputter coating and thermal evaporation) of Au micro-squares. SEM and AFM were used to characterize the surface morphologies.

关 键 词：SELF-ASSEMBLY POLYSTYRENE SPHERES PATTERN INP surface 

分 类 号：O631.3[理学—高分子化学]