后牙种植的颌间距离调整及修复体的冠-种植体比例  

The interarch-distance adjustment and the crown-implant ratio in posterior dental implant

作　　者：孙为[1] 施斌[1] 

机构地区：[1]武汉大学口腔医学院种植科,武汉430079

出　　处：《中国实用口腔科杂志》2009年第11期641-643,共3页Chinese Journal of Practical Stomatology

摘　　要：随着种植义齿治疗牙缺失作为一种常规治疗手段应用于临床,种植义齿的修复设计受到越来越广泛的关注。本文就后牙区种植义齿修复设计时颌间距离的调整,及修复体的冠-种植体比例对修复效果的影响做一综述。As implant dentistry is a widely-accepted modality for the treatment of edentulism,more and more dentists focus on the design of implantation restoration. The purpose of this article to is review the interarch-distance adjustment and the crown-implant ratio in posterior dental implantation restoration.

关 键 词：后牙 颌间距离 冠-种植体比例 

分 类 号：R783[医药卫生—口腔医学]