不同掺氮量的类金刚石薄膜的微观结构及其性能研究  

Microstructures and Mechanical Properties of N-Doped Diamond-Like Carbon Films

作　　者：周祎 马胜歌 康光宇 耿漫 

机构地区：[1]深圳八六三计划材料表面技术研发中心,深圳518029

出　　处：《真空科学与技术学报》2009年第S1期77-80,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：采用激光拉曼光谱、轮廓仪、色差仪、微纳米力学综合测试系统、摩擦磨损试验机等设备,对霍尔等离子体源辅助中频非平衡磁控溅射制备的不同掺氮量的类金刚石薄膜的微观结构及其宏观性能进行了研究。结果表明,随着氩气/氮气流量比的增加,薄膜中的sp^3含量出现极大值,极大值两侧对应着不同的微观机制。同时,薄膜的沉积速率逐渐降低,硬度与弹性模量呈现出先增大后减小。薄膜的颜色主要是黑色并随着氮气含量的增加薄膜反射率在红光波段增强。The nitrogen-doped diamond-like carbon(DLC) films were coated by Hall plasma enhanced mid-frequency unbalanced magnetron sputtering on stainless steel substrates.The microstructures and mechanical properties of the N-doped DLC films were characterized with Raman spectroscopy and conventional mechanical probes.The impacts of the film growth conditions,including the ratio of argon and nitrogen flow rates,pressure,N-contents and deposition rate,on quality of the films were studied.The results show that the film growth conditions considerably affect its mechanical properties. For instance,as Ar/N_2 flow-rate ratio increases,the sp^3 density maximizes.However,as the deposition rate slowly increases,the surface hardness and Young's modulus first increase,peaking somewhere,and then decrease.Besides,an increase of N-content results in higher reflectivity in the red light band.

关 键 词：掺氮类金刚石薄膜 微观结构 中频非平衡磁控溅射 霍尔等离子体源 

分 类 号：TN304.18[电子电信—物理电子学]