掺氮类金刚石薄膜的制备与性能研究  

Growth and Properties of Nitrogen-Doped Diamond-Like Carbon Films

作　　者：霍纯青[1] 边心超[1] 陈强[1] 

机构地区：[1]北京印刷学院印刷包装材料与技术北京市重点实验室,北京102600

出　　处：《真空科学与技术学报》2009年第S1期81-84,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：利用空心阴极放电在玻璃基底表面沉积掺氮类金刚石(DLC)薄膜。拉曼光谱(Raman)分析表明,所制备的碳膜具有典型的类金刚石结构。扫描电镜(SEM)和原子力显微镜(AFM)分析了薄膜表面形貌和粗糙度;利用摩擦磨损仪测量膜的摩擦磨损性能。结果表明,氮的掺入使得薄膜中颗粒致密平整,改变了薄膜的表面微观形貌,进而改善了薄膜的摩擦磨损性能。The nitrogen-doped diamond-like carbon(DLC) films were grown by hollow-cathode discharge on glass substrates.The impacts of the films growth conditions on the quality of DLC films were studied.The microstructures and mechanical properties of the DLC films were characterized with scanning electron microscopy(SEM),atomic force microscopy (AFM),Raman spectroscopy and conventional mechanical probes.The results show that N-doping significantly affects its surface morphology and mechanical properties.For instance,N-doping improves the surface flatness and compactness, reduces its friction coefficients,and drastically increases its adhesion at the interface of DLC films and substrates. Possible mechanisms were also tentatively discussed.

关 键 词：辉光放电 空心阴极 掺氮类金刚石薄膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]