磁控溅射WO_3电致变色薄膜的太阳吸收率  

Growth and Solar Absorption of WO_3 Electrochromic Films by DC Reactive Magnetron Sputtering

作　　者：何延春[1] 邱家稳[1] 吴春华[1] 许曼[1] 王洁冰[1] 赵印中[1] 

机构地区：[1]兰州物理研究所,表面工程技术国家级重点实验室,兰州730000

出　　处：《真空科学与技术学报》2009年第S1期98-100,共3页Chinese Journal of Vacuum Science and Technology

基　　金：表面工程技术国家级重点实验室基金(9140C5403010704)资助

摘　　要：采用直流磁控反应溅射工艺制备了WO_3薄膜。WO_3薄膜在原始状态和注入Li离子后的平均透射率分别为83%和6%,变化接近77%,表明该WO_3薄膜具有很好的电致变色性能。根据薄膜的透射率和反射率计算了WO_3薄膜的太阳吸收率:WO_3薄膜在着色态和褪色态的太阳吸收率分别为0.780和0.123。The Li-doped WO_3 electrochromic films were grown by DC reactive magnetron sputtering on glass substrates. The impacts of film growth conditions,such as the partial pressure of oxygen,sputtering power,substrate temperature, and lithium doping,on microstructures and solar absorption of the WO_3 films were studied.The results show that a judicious choice of film growth conditions results in high quality WO_3 electrochromic films.For instance,the averaged transmittances under the extraction and injection of Li ions are 83%and 6%,respectively.The solar absorptance of WO_3 films was found to be 0.780 and 0.123 in the colored and the bleached states,respectively.

关 键 词：太阳吸收率 WO₃ 电致变色 薄膜 磁控溅射 

分 类 号：TB383.2[一般工业技术—材料科学与工程]