钼薄膜制备技术研究  

Progress of molybdenum film fabrication

作　　者：雷洁红[1] 邢丕峰[1] 唐永建[1] 吴卫东[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900

出　　处：《云南大学学报（自然科学版）》2009年第S1期282-284,共3页Journal of Yunnan University(Natural Sciences Edition)

基　　金：国家高技术研究发展计划(863)资助的课题

摘　　要：钼薄膜作为散射层材料常运用在软X射线多层膜中.制备表面超光洁、厚度为几个纳米的钼薄膜对软X射线短波区多层膜的制备具有重要意义.文章介绍了制备钼薄膜的几种方法,包括化学气相沉积、机械研磨、电解抛光、磁控溅射和脉冲激光沉积.比较研究后认为脉冲激光沉积有望满足软X射线短波区多层膜的制备需要.脉冲激光沉积可以制备表面质量高(Rq<10nm),厚度可达几个纳米的薄膜,是制备薄膜的一种重要手段.Molybdenum films constantly are used for scattering layers of soft X-ray multilayers. Fabrication of molybdenum films holding ultra-glabrous surfaces and several nanometers thickness takes on important meanings for preparation of soft X-ray multilayers. In this paper,some preparative technologies of molybdenum films including Chemical Vapor Deposition,Mechanical Lapping Polishing,Electropolishing,Magnetron Sputtering and Pulsed Laser Deposition were summarized. Comparing these preparative techiniques,Pulsed Laser Deposition was the best promising preparative technique for the need of preparing soft X-ray multilayers. As films made by Pulsed Laser Deposition hold good surface quality(Rq<1nm) and several nanometers thickness,it was an important preparative method.

关 键 词：钼薄膜 表面粗糙度 脉冲激光沉积 软X射线多层膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]