Fabrication of the beam splitters for soft X-ray laser application  

作　　者：WANG Zhanshan WU Yonggang TANG Weixing QIN Shuji CHEN Lingyan XU Xiangdong HONG Yilin FU Shaojun ZHU Jie CUI Mingqi 

机构地区：[1]Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China [2]National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China [3]Institute of High Energy Physics,Beijing 100039,China

出　　处：《Chinese Science Bulletin》2003年第18期1930-1933,共4页

摘　　要：The soft X-ray interferometry is completed by the Mach-Zehnder interferometer using a soft X-ray laser, and it is also an important method to measure the electron densities of a laser-produced plasma near the critical surface. It is apparently demonstrated in this paper that the incident angle of each optical element in the soft X-ray Mach- Zehnder interferometer should be near normal incidence based on the polarized characteristics of the soft X-ray mul-tilayers, and the product of reflectivity and transmission of the beam splitter should be taken as a standard of design according to the structure of the soft X-ray Mach-Zehnder interferometer. The beam splitters used in the soft X-ray interferometry at 13.9 nm are fabricated using the ion beam sputtering. The figure error of the beam splitter has reached the nanometer magnitude, in which the product of reflectiv-ity and transmission of the beam splitter is more than 1.6%.The soft X-ray interferometry is completed by the Mach-Zehnder interferometer using a soft X-ray laser, and it is also an important method to measure the electron densities of a laser-produced plasma near the critical surface. It is apparently demonstrated in this paper that the incident angle of each optical element in the soft X-ray Mach-Zehnder interferometer should be near normal incidence based on the polarized characteristics of the soft X-ray multilayers, and the product of reflectivity and transmission of the beam splitter should be taken as a standard of design according to the structure of the soft X-ray Mach-Zehnder interferometer. The beam splitters used in the soft X-ray interferometry at 13.9 nm are fabricated using the ion beam sputtering. The figure error of the beam splitter has reached the nanometer magnitude, in which the product of reflectivity and transmission of the beam splitter is more than 1.6%.

关 键 词：SOFT X-RAY BEAM SPLITTER MULTILAYER interference. 

分 类 号：TN249[电子电信—物理电子学]