膜厚度测量的椭偏仪法原理分析  

ANALYSIS OF THE MEASURING PRINCIPLES WITH THE METHOD OF ELLIPTICAL POLARIZING APPARATUS

作　　者：陈篮[1] 周岩 

机构地区：[1]解放军广州通信学院,广州510502

出　　处：《大学物理实验》1999年第3期10-13,共4页Physical Experiment of College

摘　　要：薄膜厚度的测量通常有多种方法，但对超薄的膜厚，要达到较高精确度，且测量手段又较为简洁的，则椭偏仪法是理想的选择。本文对这种测量材料膜厚的光学方法从基本原理、仪器特点、测量过程、样品状态等方面，均作了全面的分析。There are usually various ways to measure the film thickness.It’s ideal to adopt the simple method of elliptical polarizing apparatus to measure the superthin film precisely.A comprehensive analysis is conducted as for the basic principles,characteristics of the apparatus,the measuring process and the state of samples of the optical method of material for measuring the film thickness.

关 键 词：光学 椭偏仪 薄膜 厚度 

分 类 号：O4[理学—物理]