MEASUREMENTS OF REFRACTIVE INDICES OF Ⅱ-Ⅵ WIDE GAP SEMICONDUCTOR STRAIN ED-LAYER SUPERLATTICES  

MEASUREMENTS OF REFRACTIVE INDICES OF Ⅱ-Ⅵ WIDE GAP SEMICONDUCTOR STRAIN ED-LAYER SUPERLATTICES

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作  者:崔捷 陈云良 王海龙 干福熹 

机构地区:[1]Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai 201800, PRC

出  处:《Chinese Science Bulletin》1992年第6期461-463,共3页

摘  要:I. INTRODUCTION The wide gap semiconductor superlattioes and quantum wells fabricated by ZnS, ZnSe and ZnTe are expected to be greatly useful in the optoelectronics area in the visible region. 600-700 nm wavelength optoelectronic devices with these structures have attracted much interest for the use in high-density optical information systems.

关 键 词:STRAINED-LAYER SUPERLATTICE refractive index 

分 类 号:N[自然科学总论]

 

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