共溅射沉积的TbFeCo薄膜  

CO-SPUTTERING TbFeCo FILMS

作　　者：王伟杰[1] 余维嘉[1] 姚新华[1] 肖宗耀[1] 

机构地区：[1]中国科学院上海冶金研究所

出　　处：《真空科学与技术学报》1991年第6期401-406,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：本文介绍了利用射频共溅射技术制备垂直膜面单轴各向异性TbFeCo磁光薄膜,并研究了该薄膜的磁、磁光和读写性能。测试结果表明,这种TbFeCo薄膜的磁光盘其载噪比和擦写循环分别达到48dB和1×10~6次以上。该磁光盘可适用于数据存储。Amorphous TbFeCo magneto-optical films with uniaxial magnetic anisotropy perpendicular to the films plane are prepared by rf co-sputtering technique and magnetic, magneto-optical and read/write properties of the TbFeCo film are studied. As a result, for magneto-optical disks with the TbFeCo film a carrier to noise ratio of 48dB(1μm bit)and an erase/ write cycle of more than 1×10~6 times have been realized. The disk is applicable to date memory.

关 键 词：溅射沉积 TBFECO 磁光盘 共溅射 载噪比 单轴各向异性 数据存储 单轴磁各向异性 RECORDING 氮气流量 

分 类 号：TB7-55[一般工业技术—真空技术]