源气浓度对CVD ZrC涂层的影响  

Effect of Source Gas Concentration on Preparation of ZrC Coating by CVD

作　　者：张笔峰[1] 李伟[1] 王松[1] 陈朝辉[1] 

机构地区：[1]国防科学技术大学 新型陶瓷纤维及其复合材料重点实验室,湖南长沙410073

出　　处：《稀有金属材料与工程》2013年第S1期45-48,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金重大专项资助(90916002);湖南省高校科技创新团队支持计划赞助

摘　　要：以ZrCl4、CH4为源气,H2和Ar为稀释气体和载气,采用化学气相沉积法(CVD)制备了ZrC涂层,研究了源气C/Zr比对ZrC涂层组成及形貌的影响。通过表征得出ZrC涂层表面比较粗糙,随着源气中C/Zr减小,ZrC涂层表面块状颗粒更致密,颗粒大小趋于一致;ZrC涂层中有Zr、C、O元素,含有化学计量比为1:1的ZrC相和自由碳相,随着源气中C/Zr减小,涂层中Zr的原子分数相应增大,涂层中只有约20%的Zr元素与C结合形成ZrC。Zirconium carbide (ZrC) coatings were prepared by chemical vapor deposition (CVD). ZrCl4-CH4-H2-Ar system was used in this deposition process. The effect of different C/Zr in source gas on coating properties was studied. The results show that the morphology of ZrC coating is rough, the coating contains lots of nubby grains and it becomes more compact as the C/Zr decreases in the source gas. There are three elements Zr, C and O in ZrC coating. And the coating is made up of ZrC phase and free carbon phase. But only 20% of Zr element in coating combine with C to form ZrC.

关 键 词：源气浓度 CVD ZrC涂层 

分 类 号：TB33[一般工业技术—材料科学与工程]