运用有效介质理论模拟氧化钒薄膜的光学特性  

Simulation of the Optical Properties of the Vanadium Oxide Thin Films by Effective Medium Theory

作　　者：魏雄邦[1] 廖家轩[1] 吴志明 蒋亚东 

机构地区：[1]电子科技大学,四川成都611731 [2]电子科学技术研究所 电子薄膜与集成器件国家重点实验室,四川成都610054

出　　处：《稀有金属材料与工程》2013年第S1期106-110,共5页Rare Metal Materials and Engineering

基　　金：国家自然科学基金资助(61101030)

摘　　要：采用直流反应磁控溅射法在Si(100)基片上生长了厚度分别为14.9,34.1,57.6,70.0,83.4和101.7nm的氧化钒薄膜。利用光谱式椭偏仪,并采用基于Bruggeman有效介质理论的Lorentz经典共振模型对所制备的薄膜的膜厚、折射率、消光系数进行了模拟和测量,实验表明薄膜厚度在(10～100)nm左右时,对应于633.18nm测试波长,薄膜的折射率在1.9～2.9,消光系数在0.1～1。Vanadium oxide thin films with thickness of 14.9, 34.1, 57.6, 70.0, 83.4, and 101.7 nm were deposited on Si (100) substrate by a reactive dc magnetron sputtering method. Thickness, refractive index, and extinction coefficient of the films were simulated and measured with a suitable Lorentz Oscillators model, based on the Bruggeman effective medium theory, by spectroscopic ellipsometer. The experiments demonstrate that for the VO x thin films with thickness of 10～100 nm, the film refractive index ranges from 1.9 to 2.9, and the extinction coefficient ranges from 0.1 to 1, with the optical response at 633.18 nm wavelength.

关 键 词：氧化钒 膜厚 折射率 消光系数 Lorentz共振模型 

分 类 号：O484.41[理学—固体物理]